Description

1.1 This practice covers a systematic method for analyzing sputter-depth-profile interface data and for accurately characterizing the shape of the interface region. Interface profile data are described with an appropriate analytic function; the parameters of this function define the interface width, its asymmetry, and its depth from the original surface. The use of this practice is recommended in order that the shapes of composition profiles of interfaces acquired with different instruments and techniques on different materials can be unambiguously compared and interpreted.

1.2 This practice is intended to be used to describe the shape of depth profile data obtained at an interface between two dissimilar materials for that case in which the measured concentration of the outer material goes from 100 to 0% and the inner material goes from 0 to 100%.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.